February
Sunday 3 December 2017 photo 5/15
|
Karl suss ma6 manual transmission: >> http://cxs.cloudz.pw/download?file=karl+suss+ma6+manual+transmission << (Download)
Karl suss ma6 manual transmission: >> http://cxs.cloudz.pw/read?file=karl+suss+ma6+manual+transmission << (Read Online)
The SUSS MA6 Mask Aligner is designed for high resolution photolithography in a laboratory for devel- opment, small volume production or pilot production environment. It offers unsurpassed flexibility in the handling of ir- regularly shaped substrates of varying thickness, as well as standard size wafers up to 150 mm in
The SUSS MA/BA6 mask aligner is widely recognized as a benchmark in semiconductor submicron research The MA/BA6 is designed for all standard litho- graphy applications and wafer sizes of up to. 150 mm. or infrared alignment (transmission or reflective illumination), bond alignment and the capability to process
4 Mar 2016 Bryan, Jonathan; Wood, Steven; and LOPEZ, GERALD G., "SUSS MicroTec MA6 Gen3 - S1818 Contrast Curve Data", Protocols and. Reports. Paper 20. Standard Operation Procedure. Document No: Revision: 2016-02- 4 inch Silicon Wafers. •. Benchmark Technologies multi-transmission photomask.
18 Feb 2016 Bryan, Jonathan and LOPEZ, GERALD G., "SUSS MicroTec MA6 Gen3 - S1805 Contrast Curve Data", Protocols and Reports. Paper. 17. Benchmark Technologies multi-transmission photomask Exposed at 35 mJ/cm2 using Karl Suss MA6 mask aligner with 30 micron proximity gap and multi-.
SUSS M15 3. MASK ALIGNER. Serial No. Service Manual. GENERAL DESCRIPTION AND PRINCIPLES. OF OPERATION. UTILITIES AND MACHINE . The image tube employed in the camera depends on the transmission KARL SUSS will equip each machine with the appropriate connector for 6 mm (1/4") hose.
Contact or proximity mask aligner. Manual substrate loading of wafers, partial wafers, substrate and special material processing. Lamp housing and power supply capable of using UV lamps up to 1000W 365-400nm. Capable of exposing substrates up to 150mm with appropriate chuck and mask option. Currently configured
Suss MA6 Mask Aligner User Manual. Version of 2016-07-04. Get the latest one at cmi.epfl.ch/photo/files/MA6/MA6.std.manual.pdf. 1. Introduction. This user manual explains how to operate the. Suss MA6 mask-aligner in standard. “photolithography" mode. Default illumination setup on MA6: Intensity = 20mW/cm2,
24 Jan 2017 The Karl Suss MA-6 Contact Aligner system can perform precision mask- to-wafer (sample) 1:1 contact printing in four modes; hard contact, soft contact, vacuum and proximity. It can accommodate exposure of irregularly shaped substrates and standard wafers to 6". Features: Contact. 1:1 aligner. DUV and
Find great deals on eBay for Karl Suss in Industrial Semiconductor Manufacturing Equipment. Shop with Manual substrate loading of wafers, partial wafers, substrate and special material processing. Capable of exposing Karl Suss MJB3-IR Mask Aligner with IR Transmission Alignment for Front or Backside Alignment.
Annons
Visa toppen
Show footer